Steven R. Soss

CII 6015 CIEEM
Rensselaer Polytechnic Institute
Troy, NY 12180

Work: (518) 276-8369
Home: (518) 272-4940
Fax: (518) 276-8761

Doctoral research

Effects of Texture on the Resistivity and Electromigration Resistance of Thin Copper, Silver, and Aluminum Films. The degree of texture in thin metal films is correlated to the conductivity in these films and to the degree of self-diffusion. Highly textured films give rise to grain boundaries which contain a lower dislocation density than more randomly oriented films. The lower dislocation density can be seen to not only decrease the resistivity of the metallic films, but is also seen to decrease the film's susceptibility to electromigration failure.

Objective

Challenging technical staff position in the field of microelectronics with an emphasis on the study of metallization issues

Education

Doctor of Philosophy, Applied Physics
expected Sept. 1995
Rensselaer Polytechnic Institute, Troy, NY
Relevant Coursework: Integrated Circuit Fabrication Laboratory, Metallization for VLSI and ULSI, Thermostatics, Lasers and Optics, Solid State Physics
Bachelor of Arts, Physics
May, 1990
University of Pennsylvania, Philadelphia, PA
Senior Thesis: Second Harmonic Generation in BBO Crystals for the Testing of Detectors in the Sudbury Neutrino Observatory

Experience

9/90 - present
Center for Integrated Electronics, Applied Physics Department, RPI, Troy, NY
Research on the growth of highly textured metallic films using the partially ionized beam deposition system. Emphasis on the role of texture to the resistivity and electromagnetic resistance of copper, silver, and aluminum thin films. Investigated role of ion assisted deposition on the densification and orientation of metallic films.
- 5 years of high vacuum and cleanroom experience, emphasis in metallization
- module lead for X-ray, pole figure X-ray, and atomic force microscopy
- electrical stability and stress measurements of Cu, Ag, and Al on oxide
- dislocation density effects on the self diffusion of Cu on Ta
9/90 - 1/93
Teaching Assistant, Applied Physics Department, RPI, Troy, NY
Recitation instructor for introductory physics courses
5/89 - 9/89
Physics Department, University of Pennsylvania, Philadelphia, PA
Designed and implemented a test station for the characterization of large photodetectors for use in the Sudbury Neutrino Observatory

Publications and Presentations

"Dielectric Constant Dependence of Poole-Frenkel Potential in Tantalum Oxide Thin Films", X.M. Wu, S.R. Soss, E.J. Rymaszewski, and T.-M. Lu, Journal of Chemistry and Physics of Materials, Vol. 38, (1994) pp. 297-300.
"Amorphous SI:B Films: Microstructure, Oxidation, and Electrical Properties", G.-R. Yang, S.R. Soss, T.C. Nason, X.-F. Ma, A. Cocoziello, B.Y. Tong, Y.T. Zhu, J. DU. and K.F. Tjew, Journal of Vacuum Science and Technology A, Vol. 12, No. 4, (July-Aug 1994) pp. 1054-62.
"Partially Ionized beam Deposition of Ag Films on Insulating Substrates", S.R. Soss, C.A. Cook, and T.-M. Lu, Journal of Applied Physics, Vol. 77, (March, 1995) pp. 2735-39.
"Microstructural Effect on the Resistivity of Thin Films", S.R. Soss, B.D. Gittleman, D. Tracy, S. Lee, and T.-M. Lu, submitted to Applied Physics Letters. "
Epitaxial Quality of Thin Ag Films on GaAs(100) Surfaces Cleaned with Various Wet Etching Techniques", K.E. Mello, S.R. Soss, S.P. Murarka, and T.-M. Lu, submitted to Applied Physics Letters.
"Electron Transport in Highly Textured Metal Thin Films Grown by Partially Ionized Beam Deposition", S.R. Soss, S. Liu, E.J. Pymaszewski, and T.-M. Lu, submitted to Materials research Society Proceedings, November 1995 meeting.
"Room Temperature Deposition of High Dielectric Constant High Density Ceramic Thin Films", K. Chen, P.K. Wu, S.R. Soss, E.J. Rymaszewski, and T.-M. Lu, submitted to Applied Physics Letters.
"Partially Ionized Beam Deposition of Silicon Monoxide Thin Films", K. Chen, P.K. Wu, S.R. Soss E.J. Rymaszewski, and T.-M. Lu, submitted to Applied Physics Letters.
"Relation Between Intergrain Dislocation Density and Resistivity in Cubic Structure Metal Films", S.R. Soss, B.D. Gittleman, S. Lee, and T.-M. Lu, in preparation.

Honors and Affiliations

Recipient, Department of Education Fellowship (1993)
Member, Materials Research Society
Member, American Physical Society

Computer Skills

Systems administrator, Applied Physics Department, RPI, Troy, NY (September, 1994 - present) Maintain PC and RISC6000 computer laboratories, including software installation, account maintenance, and network services.
Extensive experience in the C and C++ programming languages as well as Fortran, Pascal, and Basic on UNIX, MS DOS, Windows, and Macintosh platforms. Also familiar with many graphic and word-processing packages, as well as scientific packages including TSuprem and Construct.

References

Available upon request.

Contact Steven Soss

This page was last updated July 28, 1995.

Responses to: Prof. T.-M. Lu

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