T.-M. Lu: Research Interests
Advanced Thin Film Materials and Processing for Interconnect and
Integrated Chips Technologies
Thin Film Metallization and Texture
Synthesis and Deposition of Low Dielectric
Constant Vapor Depositable Polymers
- room temperature deposition of BaTiO3, TaOx, and SiOx
- room temperature deposition of resistor materials: TaN, MoSi2 and thin
oxides
- fabrication and testing of high dielectric films on polymer based
substrates
Photonic Materials for Integrated Waveguides
- vapor deposition of high electro-optic coefficient organic thin films
- low temperature processing of integrated passive waveguides using high/low
index organic/inorganic thin films
Lab Techniques Utilized
Deposition Techniques
- RPIB (Reactive Partially Ionized Beam)
- Reactive DC Magnetron Sputtering
- Vacuum Evaporation
- CVD (Chemical Vapor Deposition)
Analysis Techniques
- XPS (X-ray Photoelectric Spectroscopy)
- SEM (Scanning Electron Microscopy)
- FTIR (Fourier Transform Infrared Spectroscopy)
- XRD (X-ray Diffraction)
- UV (Ultraviolet) Absorption Spectroscopy
- C-V (Capacitance-Voltage) Analysis
- I-V (Current-Voltage) Analysis
- SIMS (Secondary Ion Mass Spectroscopy)
- AFM (Atomic Force Microscopy)
- DSC (Differential Scanning Calorimetry)
- NMR (Nuclear Magnetic Resonance) Spectroscopy
- RBS (Rutherford Backscattering Spectometry)
- TEM (Tunneling Electron Microscopy)
- Ellipsometry
- Electron Microprobe
- High Frequency Testing
Group Members

Credits
This page was last updated August 1, 1995.
Responses to: Prof. T.-M. Lu