Micro and Nano Fabrication Clean Room
Processes
-
High Temperature
- RTA
The following tools are presently used for Rapid Thermal Annealing:
Compound Semiconductor RTA
MNCR Staff
Clean Room
Manager
David King
(518)-276-2938
kingdc@rpi.edu
Senior Applications
Engineer
David Frey
(518)-276-3323
freym2@rpi.edu
Process
Engineer
Bryant Colwill
(518)-276-3946
colwib2@rpi.edu
Equipment
Engineer
John Barthel
(518)- 276-2975
barthj@rpi.edu
Equipment
Engineer
Kent Way
(518)- 276-3317
wayk2@rpi.edu