Links
|
Standard Processes
- RCA Clean (CMOS
compatible silicon wafers ONLY)
Note:
RCA Clean is the ONLY process
allowed at this wet bench. No other processes are allowed.
Support Equipment
- Two 8" heated baths with temperature
controllers
- One 8" bath (not heated) for 20:1 HF dip
- 12" hotplate
- Quick Dump Rinser (QDR) with controller
- Aspirators
Training & Usage
Contact the module lead for the
equipment and process
you need. Be sure to look for the process you need in the list
above,
click on the links above for processes that have online documentation.
Some processes require a step in a fume hood, for example RCA cleaning
is
required before oxidation in the Bruce or ASM furnaces,
photolithographic
developing is required after exposure in the Karl Suss aligner or the
GCA
stepper. In these cases, the module lead for the primary
equipment
will train the user on the wet bench process (see training for Karl
Suss
mask aligner, GCA stepper, Bruce furnace, and ASM furnace).
Reservations
Use of fume hoods is on a first
come, first served basis. |
Procedures
& Documentation
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