Micro and Nano Fabrication
Clean Room



Click here to return to MCR Home Page

Processes - High Temperature - PECVD - P5000

 For training on this equipment, contact the assigned module leads
Applied Materials P5000

Applied Materials P5000

Links

(Under Construction)

Pictures

(Under Construction)

Commercial Laboratories

(Under Construction)

Misc.

(Under Construction)

GG dd

General Information

The P5000 is a multichamber PECVD system from Applied Materials. This tool is configured for deposition of TEOS and Silicon Nitride. It also has a chamber for sputter etching.

Contact the module lead for further process information.

 

Training & Usage

(Under Construction)

Procedures & Documentation

 (Under Construction)