Micro and Nano Fabrication
Clean Room





Processes - High Temperature - Diffusion - Bruce Furnace

For training on this equipment, contact the assigned module leads
Bruce Oxidation Furnace

Bruce Oxidation Furnace


Links


Bruce Furnace Recipe Programming Spreadsheet (requires Microsoft Excel)

Bruce Furnace Recipe  Examples:

2000A Dry Oxidation
(Requires Microsoft Excel)

POCL3
(Requires Microsoft Excel)

Wet Oxidation
(Requires Microsoft Excel)



General Information

The Bruce Oxidation Furnace is used for forming oxide on silicon wafers, using a dry or wet oxidation process.  It can also be used for high temperature anneals.

Training & Usage

Please contact the module leadto schedule a training session. After attending the training session, you are expected to return within one week with your own sample to test in the presence of the module lead. You may NOT use the equipment unsupervised until you have successfully passed the test.

If you do not log onto the Bruce Furnace for any sixty (60) day period, you forfeit your qualification and must schedule your next session with the module lead to re-test. 

Currently, the equipment is password protected. Qualified users are notified of the current password, as well as the equipment condition, via e-mail on a weekly basis


Reservations

Reservations for the equipment may be made on the scheduling sheet next to the equipment, or by contacting the module lead.

Procedures & Documentation:

  1. Shutdown
  2. Startup

Characterization Data (Requires Microsoft Excel)

10-03-06
01-16-07
03-02-07
08-14-07 (Dry Oxidation - Target 1000A)