Micro and Nano Fabrication
Clean Room

Processes - High Temperature - Diffusion - ASM Furnace

For training on this equipment, contact the assigned module leads
ASM Oxidation Furnace

ASM Oxidation Furnace

Links (Under Construction)

General Information

The ASM Oxidation Furnace is used for forming oxide on 8" or smaller silicon wafers, using a dry or wet oxidation process.  It can also be used for high temperature anneals.

Training & Usage

Please contact the module lead to schedule a training session. After attending the training session, you are expected to return within one week with your own sample to test in the presence of the module lead. You may NOT use the equipment unsupervised until you have successfully passed the test.

If you do not log onto the ASM Furnace for any sixty (60) day period, you forfeit your qualification and must schedule your next session with the module lead to re-test. 

Currently, the equipment is password protected. Qualified users are notified of the current password, as well as the equipment condition, via e-mail on a weekly basis


Reservations for the equipment may be mader by contacting the module lead.

Procedures & Documentation

Characterization Data

400A Dry Oxidation Run 10-18-06

400A Dry Oxidation Run 11-01-06

400A Dry Oxidation Run 11-03-06

400A Dry Oxidation Run 11-09-06

400A Dry Oxidation Run 11-29-06

1200A Dry Oxidation Run 12-02-06

400A Dry Oxidation Run 12-05-06

1 Micron Wet Oxidation Run 05-03-07

1 Micron Wet Oxidation Run 05-09-07

1 Micron Wet Oxidation Run 08-20-07