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Processes - Etch - Dry Etch - Alcatel AMS100

For training on this equipment, contact the assigned module leads

Alcatel AMS100

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General Information


The Alcatel AMS100 is used for Reactive Ion Etching of Silicon and Silicon Oxide coated 200 mm wafers.  Smaller wafers can be etched, but require a specially designed carrier wafer to hold it.  See the Module Lead for this carrier wafer.


Training & Usage

Please contact the module lead to schedule a training session. After attending the training session, you are expected to return within one week with your own sample to test in the presence of the module lead. You may NOT use the equipment unsupervised until you have successfully passed the test.

Reservations

Reservations for this equipment can be made by contacting the module lead.

Procedures and Documentation (Under Construction)