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General
Information
The Alcatel AMS100 is used for Reactive Ion Etching of Silicon and
Silicon Oxide coated 200 mm wafers. Smaller wafers can be etched,
but require a specially designed carrier wafer to hold it. See
the Module Lead for this carrier wafer.
Training & Usage
Please contact the module
lead to
schedule a training session. After attending the training session, you
are
expected to return within one week with your own sample to test in the
presence
of the module lead. You may NOT use the equipment
unsupervised until
you
have successfully passed the test.
Reservations
Reservations for this equipment can be made by contacting the module lead.
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Procedures and Documentation (Under Construction)
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