
Dr. Ishwara Bhat
Professor
Electrical, Computer and Systems Engineering Department
Rensselaer Polytechnic Institute
Troy, New York 12180
Contact Information
Electrical, Computer, and Systems
Engineering Department
Rensselaer Polytechnic Institute
110 8th Street, Troy, NY 12180-3590
Phone: (518) 276-2786 Fax: (518) 276-8761
E-Mail: bhati@rpi.edu
Education:
Ph.D.May 1985 - Electrical Engineering ,Rensselaer Polytechnic
Institute, Troy, New York
M. S.December 1981 - Electrical Engineering, Rensselaer Polytechnic
Institute, Troy, New York
B. Tech.June 1980 - Electrical Engineering, Indian Institute
of Technology, Madras, India
Ishwara B. Bhat is a Professor of Electrical, Computer
and Systems Engineering Department at RPI. He received his B.S.E.E. degree
from Indian Institute of Technology, India and his M.S. and Ph.D. degrees
from Electrical Engineering, Rensselaer Polytechnic Institute (RPI). He
has over 20 years of experience in epitaxial growth and characterization
of several II-VI, III-V and IV-IV semiconductors. He was the Co-Chair of
1996 and 2000 II-VI workshops held in Las Vegas, NV and Albuquerque, NM
respectively and has edited several special issues of Journal of Electronic
Materials. He has served as the member of the Program Committee of several
national and International Conferences. Professor Bhat has published over
75 articles in refereed journals.
Research Interest
His research
interests included growth of wide band gap semiconductors (such as GaN,
SiC and ZnSe) and narrow band semiconductors (such as HgCdTe, InGaSb).
His accomplishments included first demonstrations of: (a) p type doping
of HgCdTe by MOVPE, (b) p type doping of ZnSe by MOVPE using phenylhydrazine,
and, (c) several in-situ grown IR devices in HgCdTe, and development of
ELO growth process for CdTe on Si.
Prof. Bhat
had over 10 multiyear contracts with various government agencies and industrial
labs. His current research is focused on the growth of silicon carbide
epitaxial films for use in high power, high temperature and high voltage
devices, as well as the growth of InGaSb for application in multi-IR technology.
Appointments:
1999-Professor, Electrical,
Computer and Systems Engineering Department Rensselaer Polytechnic Institute,
Troy, NewYork.
1991-1999Associate
Professor, Rensselaer Polytechnic Institute.
1988-1991
Research Assistant Professor, Rensselaer Polytechnic Institute.
1985-88
Research Associate, Rensselaer Polytechnic Institute.
Selected Publications
1.Rongjun
Wang, Ishwara B. Bhat,and T. Paul Chow, Epitaxial growth of n-type SiC
using phosphine and nitrogen as the precursors, Journal of Applied Physics,
p7587-7592 (2002).
2.Hao
Cui, Ishwara B. Bhat, Shyam Murarka, Hongqiang Lu, Wei-Jen Hsia, and Wilbur
Catabay,Copper drift in methyl-doped silicon oxide film, J. Vac. Sci. Technol.
B 20(5), p 1987-1993 (2002).
3.R.
Zhang, and I. Bhat, Atomic Force Microscopy Studies of CdTe Films Grown
by Epitaxial Lateral Overgrowth, J. Electron. Mater., V30, p1370 - 1376,2001.
4.Hao
Cui, I. Bhat, B. OQuinn, and R. Venkatasubramanian,In-situ monitoring of
the growth of Bi2Te3 and Sb2Te3 films and Bi2Te3-Sb2Te3 suprelattice using
spectroscopic ellipsometry, J. Electron. Mater; v30, p1376 - 1382, 2001.
5.R.
Zhang, and I. Bhat,Selective growth of CdTe on Silicon and GaAs substrates,
J. Electron. Mater., V29, p765-769,2000.
6.H.
Ehsani, I. Bhat, R. J. Gutmann, G. Charache and M. Freeman,The Role of
Relative Tilt on the Structural Properties of GaInSb Epitaxial Layers Grown
on (001)GaSb Substrates, J. Appl. Physics, 86, 835 - 841, (1999).
7.S.
Dakshinamurthy and I. Bhat, "In-situ monitoring of CdTe nucleation on GaAs
(100) using spectroscopic ellipsometry", J. Crystal Growth, 170, 193-197,
(1997).
8.H.
Lu, M. Thothathiri, Z. Wu and I. Bhat, "Study of indium droplets formation
on the InGaN films by single crystal x-ray diffraction", J. Electronic
Mater., 26, 281-286, (1997).
9.H.
Lu and I. Bhat, "Photoassisted anodic etching of GaN", J. of Electrochemical
Society, v144, L8-L11, (1997).
10.S.
Dakshinamurthy and I. Bhat, Monitoring of CdTe ALE nucleation using in-situ
spectroscopic ellipsometry, J. Electron. Mater. Vol. 27, pp 521 -526, 1998.