B. Wayne Bequette
Chemical Process Dynamics and Control
Picture of the Control Engineering Studio (JEC 4304).
This studio was used before laptop computers were required at RPI. Course development activities were partially funded by a curriculum development grant from Procter & Gamble.
Case Study Projects
connect theory and practice.
IEEE Control Systems Magazine article
(718 kB) discussing our approach to teaching process control using a laptop studio.
Model Predictive Control
Advanced Process Control
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