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Associate Professor
School of Engineering
Department of Materials Science & Engineering
The Center for Advanced Interconnect Systems Technologies
Rensselaer Nanotechnology Center
Multiscale Science and Engineering Center
Center for Integrated Electronics
Ph.D., Physics, University of Illinois
M.S.,
Physics, University of Basel, Switzerland
B.S.,
Physics, University of Basel, Switzerland
Prof. Gall has been a Visiting Scientist at the Frederick Seitz Materials Research Laboratory, Illinois, has served as Assistant Editor and Editorial Board Member for Thin Solid Films, and as Associate Editor for the Journal of Vacuum Science and Technology A. He is the elected secretary of the AVS Advanced Surface Engineering Division and serves as session chair, program committee chair, and proceedings editor for the International Conference for Metallurgical Coatings and Thin Films and the AVS International Symposium.
Thin film and nanostructure growth from the vapor phase, with particular focus on the atomic-level processes that control surface diffusion, growth kinetics, and microstructural evolution. Atomic shadowing and ion-surface interactions are exploited to design nanostructures with applications as sensors, electronic materials, self-lubricious hard coatings, and energy conversion devices.
Daniel Gall
Materials Research Center
Room 204
Rensselaer Polytechnic Institute
110 8th Street
Troy, New York 12180
Office: (518) 276-8471
E-Mail: galld@rpi.edu