CHME-4600

Introduction to Semiconductor Processing

The basic processes used for fabrication of silicon-based semiconductor devices with emphasis on the chemical principles and systems involved. Topics include materials preparation, oxide growth, lithography, diffusion, ion implantation, epitaxial growth, chemical-vapor deposition, vacuum deposition, reactive ion etching, and packaging technologies. Fabrication of both bipolar and FET devices is discussed with emphasis on manufacturing process flow and control. Process design methodology. Prerequisite: senior standing in chemical engineering or permission of instructor. Fall term annually.

3 credit hours